Vacuum chamber arrangement for charged particle beam generator

ABSTRACT

The disclosure relates to an electron-optical module of an electron-optical apparatus. The electron-optical module comprises a vacuum chamber, a high voltage shielding arrangement located within the vacuum chamber, and an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement. Wherein the electron-optical module can be configured to be removable from the electron-optical apparatus.

This application is a continuation of application Ser. No. 16/796,849, filed Feb. 20, 2020, which is a continuation of application Ser. No. 15/493,159, filed Apr. 21, 2017 (now U.S. Pat. No. 10,586,625), which is a continuation in part of U.S. application Ser. No. 14/541,233 filed on 14 Nov. 2014 now U.S. Pat. No. 9,905,322), which claims priority to U.S. provisional application No. 61/904,057 filed on 14 Nov. 2013. Application Ser. No. 15/493,159 is also a continuation in part of U.S. application Ser. No. 14/400,569 filed on 12 Nov. 2014 (now U.S. Pat. No. 9,653,261), which is a national stage entry of PCT/EP2013/059963 filed on 14 May 2013, which claims priority to U.S. provisional application No. 61/646,839 filed on 14 May 2012. All these applications are hereby incorporated by reference in their entirety.

TECHNICAL FIELD

The invention relates to a charged particle beam generator and to a target processing machine comprising a charged particle beam generator. More specifically, the invention relates to a vacuum chamber arrangement for use in a charged particle beam generator or in a target processing machine comprising a charged particle beam generator.

BACKGROUND

In the semiconductor industry, an ever-increasing desire exists to manufacture smaller structures with high accuracy and reliability. Lithography is a critical part of such manufacturing process. In a mask-less lithography system, charged particle beamlets may be used to transfer a pattern onto a target. The beamlets may be individually controllable to obtain the desired pattern.

To be commercially viable, the charged particle lithography systems need to be able to meet challenging demands for substantial wafer throughput and stringent error margins. A higher throughput may be obtained by using more beamlets, and hence more current.

However, the handling of a greater number of beamlets results in the need for more control circuitry. The operational control circuitry may cause heating within the lithography system. Furthermore, an increase in the current results in more charged particles that interact with components in the lithography system. The collisions between charged particles and system components inside the lithography system may cause significant heating of respective components. The resulting heating of beam manipulation components may lead to thermal deformations that reduce the accuracy of the lithography process.

The use of a large number of beamlets further increases the risk of unacceptable inaccuracy due to inter-particle interactions between the beamlets (e.g. Coulomb interactions).

The effects of inter-particle interactions may be reduced by shortening the path between particle source and target. Path shortening may be achieved by using stronger electric fields for manipulating the charged particles, which requires application of larger electric potential differences between various electrodes in the charged particle lithography system.

With higher electric fields strengths, the shape and layout of the collimator electrodes become more important determinants of the achievable accuracy for the electric field distribution, and hence on the beam generation and shaping accuracy.

SUMMARY OF THE INVENTION

It would be desirable to provide a charged particle beam generator and target processing machine, which allow the use of a great number of charged particle beamlets while achieving high beam collimation field accuracy.

It is an object of the invention to provide a charged particle beam generator with an improved vacuum chamber arrangement. For this purpose, the invention provides a charged particle beam generator and a target processing machine as described in this specification and claimed in the appended claims.

It will be evident that the presently invented principle may be set into practice in various manners.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments will now be described, by way of example only, with reference to the accompanying schematic drawings, in which corresponding reference symbols indicate corresponding parts, and in which:

FIG. 1 schematically shows a perspective view of a charged particle lithography system according to an embodiment;

FIG. 2 presents a frontal view of a vacuum chamber of a charged particle lithography system according to an embodiment;

FIG. 3 shows a schematic side view of a beam generator according to an embodiment;

FIG. 4 shows a perspective view of a collimator electrode stack according to an embodiment;

FIG. 5 shows a perspective view of a collimator electrode according to an embodiment;

FIG. 6 shows a schematic cross-sectional side view of a collimator electrode stack according to an embodiment.

FIGS. 7 a-7 d shown cross-sectional top and side views of collimator electrodes according to embodiments;

FIG. 8 shows a detailed top view of a beam generator according to an embodiment;

FIGS. 9-11 show perspective views of a beam generator according to another embodiment;

FIG. 12 shows a cross-sectional side view of a lower portion of a beam generator according to an embodiment;

FIG. 13 shows a cross-sectional side view of a support column in a collimator electrode stack according to an embodiment;

FIG. 14 shows a cross-sectional side view of cooling conduits in a collimator electrode stack according to an embodiment;

FIG. 15 shows a support system in a collimator electrode stack according to another embodiment;

FIG. 16 schematically shows an exemplary charged particle beam generator according to an embodiment of the invention;

FIG. 17 schematically shows an overview of an exemplary beam generator according to an embodiment of the invention;

FIG. 18 shows an elevated side view of an exemplary beam generator according to an embodiment of the invention;

FIG. 19 shows a first cross-sectional side view of the beam generator of FIG. 18 ;

FIG. 20 shows a second cross-sectional side view of the beam generator of FIG. 18 ;

FIG. 21 shows an elevated side view of the beam generator of FIG. 18 ; and

FIG. 22 shows another elevated side view of the beam generator of FIG. 18 .

The figures are meant for illustrative purposes only, and do not serve as restriction of the scope or the protection as laid down by the claims.

DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS

The following is a description of certain embodiments of the invention, given by way of example only and with reference to the drawings.

FIG. 1 schematically shows a perspective view of a target processing machine, such as a lithography system 10. Such a lithography system 10 is adapted for lithographic processing of a semiconductor target 31 (e.g. the creation of structures onto a resist-covered semiconductor substrate). The lithography system 10 comprises (at a lower side) a vacuum chamber 30 for accommodating a projection column 46, and (at an upper side i.e. positioned above the vacuum chamber 30) a cabinet 12 for accommodating electronic equipment 22.

The cabinet 12 comprises a closable casing, defined by wall panels and provided on a front side with an opening 14 for accessing the interior of the cabinet 12. Two doors 15 are provided for covering the opening 14. The walls and doors define a cuboid shape that can be closed in a sealing manner to prevent air from entering the cabinet 12. The cabinet 12 encloses laterally spaced racks 18 carrying shelves 20 for housing the electronic equipment 22. On the top side 32, the vacuum chamber 30 is provided with a recessed section that comprises an interface wall 35 with access ports 36 for letting through conduits/cables 26 emanating from the beam projection column 46 inside the vacuum chamber 30 to electronic equipment 22 inside of the cabinet 12.

The vacuum chamber 30 is arranged for accommodating the target 31 and the projection column 46. The vacuum chamber 30 comprises a vacuum casing 39 (outer layer) that is configured to retain a vacuum environment on its inside (typically 10⁻³ bar or lower). Inside the vacuum casing 39, there is provided a support casing 40 (intermediate layer), and a carrier casing 41 with a carrier frame 42 (innermost region). The projection column 46 is supported by the carrier frame 42 on an inside of the carrier casing 41. The projection column 46 is configured for generating and manipulating multiple processing beamlets 47 that are used for processing the target 31. The projection column 46 may comprise various optical elements. Exemplary elements may be: an aperture array for forming a plurality of beamlets from the charged particle beam, a beamlet modulator for patterning the beamlets to form modulated beamlets, and a beamlet projector for projecting the modulated beamlets onto a surface of the target 31.

FIG. 2 shows a simplified schematic drawing of an embodiment of a charged particle lithography system 10. Such lithography systems are described for example in U.S. Pat. Nos. 6,897,458; 6,958,804; 7,019,908; 7,084,414; 7,129,502; 8,089,056 and 8,254,484; U.S. patent application publication no. 2007/0064213; 2009/0261267; US 2011/0073782; US 2011/0079739 and US 2012/0091358, which are all assigned to the owner of the present invention and are all hereby incorporated by reference in their entirety.

FIG. 2 presents a frontal view a vacuum chamber 30 of a target processing system 10. The projection column 46 with a charged particle beam generator 50 is accommodated by the carrier frame 42 on the inside of the vacuum chamber 30. The charged particle beam generator 50 is formed as a beam generator module that is insertable into and removable from the carrier frame 42 inside the vacuum chamber 30 of the charged particle lithography system 10. The carrier casing 41 and carrier frame 42 are moveably suspended within the support casing 40 by means of suspension members 44 (e.g. leaf springs) that are connected to a suspension base 43, which in turn is moveably interconnected with the carrier casing 41 by means of a plurality of rigid but laterally hingeable suspension rods 45.

A charged particle beam 54 is generated by the charged particle beam generator 50, and subsequently manipulated by the various optical elements provided in the projection column 46.

The term “refracting” is used herein to generally indicate the action of deflecting portions of a beam. The term “collimating” is used herein to indicate the action of making various portions of a beam more parallel.

FIG. 3 shows a schematic cross-sectional view of a beam generator module 50 according to an embodiment. The cross sectional view is defined in an axial-radial plane i.e. which is spanned by the axial direction Z and the radial direction R.

Shown in FIG. 3 is a beam generator chamber 51, which encloses elements, components and/or modules that make up the beam generator 50. The beam generator 50 comprises a charged particle beam source 52, a collimator stack 70, and vacuum pumps 122, 123 for creating a vacuum inside the beam generator chamber 51 (only vacuum pump 122 is shown).

The beam source 52 is accommodated within a beam source vacuum chamber 53, which in turn is located within the beam generator chamber 51. The beam source 52 is fixed to a top side of the collimator stack 70, and configured to generate a charged particle beam 54 along optical axis A. The beam source chamber 53 encloses source vacuum pump units 120, which allow an ultra-low vacuum to be created locally near the beam source 52, to improve its radiation emission efficiency and prolong its effective radiation lifetime.

The charged particle beam 54 generated by the charged particle source 52 may initially have radially outward diverging properties while travelling along the optical axis A. The collimator electrode stack 70 may then serve to refract portions of the charged particle beam 54 selectively, thereby collimating the beam i.e. making the various parts of the beam distribution travel downstream with greater co-linearity along the optical axis A.

Collimator stack 70 comprises an axially arranged stack (i.e. sequence) of collimator electrodes 71-80 that are mutually displaced along the axial direction Z by means of spacing structures 89, which are made of an electrically insulating material. The collimator electrodes 71-80 are formed by flat ring-shaped bodies 81, each of which comprises an electrode aperture 82. In the shown embodiment, the ring-shaped bodies 81 are displaced at equal distances Hd along the optical axis A, and the electrode apertures 82 are coaxially aligned along the optical axis A. The electrode bodies 81 are preferably made of an electrically conducting and mechanically rigid material. Sufficient electrical conductivity enables easy application of a homogeneously distributed electrical charge onto each respective surface of the collimator electrodes 71-80. Sufficient mechanical rigidity allows the collimator electrodes 71-80 to retain a fixed spatial configuration and hence to sustain steady electric potential differences during generation of the particle beam 54. Preferably, the electrodes 71-80 are made from aluminum. Aluminum is a light-weight material with good electrical conductance and non-magnetic properties, and which furthermore provides sufficient thermal conductance for dissipating thermal energy that is accumulated during charged particle beam generation.

The formation of a plurality of collimator electrodes 71-80 and spacing structures 89 into a coaxially aligned electrode stack 70 provides the possibility to optimize the electric field distribution within the collimator stack 70 at different positions along the optical axis A. The use of a plurality of separated collimator electrodes 71-80 allows for a relatively lightweight design.

Thicknesses H1, H5, He of the collimator electrodes 71-80 along the vertical direction Z may be sufficient for accommodating a liquid conduit 105 on an inside of respective electrode bodies 81, while ensuring sufficient structural integrity of the electrode body 81 during beam generation, even under considerable thermal stresses.

An uppermost collimator electrode 71 in the collimator stack 70 (i.e. the collimator electrode 71 that is encountered and traversed first by the charged particle beam 54 upstream of the stack 70) comprises a diverging curved aperture. A last collimator electrode 80 in the collimator stack 70 (i.e. the collimator electrode that is encountered last by the charged particle beam 54 downstream along the optical axis A) has a relatively small inner thickness H10. Electrode properties of the stack are further discussed with reference to FIG. 6 .

The collimator electrodes 71-80 are spaced with respect to each other by means of the electrically insulating spacing structures 89. The spacing structures 89 define a minimal distance Hd between the electrodes 71-80, which prevents the occurrence of electrical discharge between adjacent electrodes, even at relatively large electrical potential differences that are to be applied between the electrodes during beam generation (potential differences in the order of kilovolts per millimeter).

The spacing structures 89 are made of an electrically insulating material that also has a high resistance to mechanical compression, to keep the distances between the electrodes fixed, and to avoid the electrodes from becoming electrically connected (i.e. becoming electrical equipotential surfaces). The spacing structures 89 may for example be made of a ceramic. Preferably, each spacing structure 89 is provided between a pair of adjacent collimator electrodes. Three such spacing structures 89 are provided between each pair of adjacent collimator electrodes, to provide two stable 3-point support planes, one for each adjacent collimator electrode, while maintaining a well-defined inter-electrode spacing Hd.

The collimator stack 70 is suspended within the beam generator chamber 51 by means of support protrusions 92 b and support legs 93 that surround the stack 70 on three sides. The support legs 93 are used to fix the collimator stack 70 with respect to an external reference frame (e.g. carrier frame 42).

Embodiments of the cooling arrangement (e.g. comprising elements 110-114 and 116-119) are described herein below, in conjunction with FIGS. 7 a -7 d,

FIG. 4 shows a perspective view of a collimator electrode stack 70 according to an embodiment. This embodiment comprises ten collimator electrodes 71-80 for shaping the electron beam 54 propagating along the optical axis A in the axial direction Z.

The first collimator electrode 71 comprises source engagement members for fixing the charged particle beam source 52 to the first collimator electrode 71 on a top side thereof, and source alignment members for aligning the optical axis A of the generated charged particle beam 54 with a centerline of the collimator apertures.

Each of selected collimator electrodes 71-74, 76-80 comprises three support portions 86 along an outer electrode perimeter. Each support portion 86 accommodates a spacing structure 89 on one side, and possibly another spacing structure 89 on the opposite side. In this embodiment, the spacing structures 89 are formed by cylindrical objects with flat end surfaces that support or are supported by the electrode support portions 86. Cylindrical spacing structures 89 with uniform diameters are easy to manufacture in large numbers, which facilitates construction and maintenance of the collimator stack 70. In addition, the rounded shape of the cylindrical spacing structures 89 helps to reduce perturbing effects of the spacing structures on the electric field inside the electrode collimator stack 70. Construction of the collimator stack 70 is further facilitated and standardized by manufacturing spacing structures 89 with a uniform predetermined spacer height Hs. This allows all collimator electrodes 71-80 to be efficiently aligned and spaced over equal predetermined mutual distances Hd along the axial direction Z.

In the shown embodiment, three of such electrically insulating cylindrical spacing structures 89 are arranged between each adjacent pair of electrodes. Three spacing structures 89 form a radially and angularly equally spaced tripod i.e. each spacing structure 89 is located at an equal radial distance from the optical axis A, and the three spacing structures 89 are mutually spaced at 1800 angles about the optical axis A. The resulting three-point support allows the collimator electrodes to be carried along their respective transversal planes in a stable manner, and allows electrode alignment with a high accuracy (typically with a maximum alignment error below 10 micrometers). The equal radial and/or angular spacing is not essential, but yields a preferred robust arrangement that facilitates accurate collimator alignment.

The electrode support portions 86 of adjacent collimator electrodes and interposed spacing structures 89 are axially aligned to define support columns 90 directed parallel with the axial direction Z. Three support columns 90 are defined in this embodiment.

The support columns 90 are each provided with clamping members 91 a, 91 b, for holding the support portions 86 and interposed spacing structures 89 together. Ledgers 91 a are provided at axial extremities of the support columns 90. The ledgers 91 a arc pulled together along the axial direction Z by means of two pre-tensioned rods 91 b that connect the ledgers 91 a at the rod ends. The clamping members 91 a, 91 b are made of a rigid material that has sufficient tensile strength to provide a robust clamping mechanism with which the collimator electrodes 71-80 and spacing structures 89 can be axially compressed into mutually fixed positions. Each pre-tensioned rod 91 b may be provided with a narrowing 91 c, to accommodate differential thermal expansion between the collimator stack 70 and the respective pre-tensioned rod 91 b. The clamping members 91 a, 91 b are preferably made of a non-magnetic material, to avoid generation of perturbing field responses to the magnetic fields generated by the charged particle beam 54. In view of the above, the clamping members 91 a, 91 b are preferably made of titanium.

The collimator electrode stack 70 comprises three stack support legs 93. Each support leg is connected to a middle region 75 a of the collimator stack 70. The support legs 93 cooperate to support the collimator stack 70 with respect to an external reference frame. The external reference frame may for example be the carrier frame 42 suspended inside the vacuum chamber 30 of the charged particle lithography system 10 shown in FIG. 1 .

During beam generation, mechanical resonances may be induced within the collimator stack 70 from external sources (e.g. from floor vibrations that reach the collimator stack 70 via the carrier frame 42, and from flow fluctuations occurring in cooling liquid that is pumped through cooling conduits 105 in the collimator electrodes 71-80). By supporting the collimator stack 70 via connection of the support legs 93 to the middle region 75 a, the lengths and weights of stack portions that participate in induced mechanical resonances are reduced.

The induced mechanical resonances may relate either to linear motion, to rotational motion, or to both. By reducing the effective stack lengths, the effective linear spring constant for deflections perpendicular to the axial direction Z is increased, as shorter columns 90 make stiffer columns. Stiffer columns reduce transversal deflection response of the electrodes 71-80 in the stack. With stiffer columns 90, the electrodes 71-80 will vibrate less with respect to each other, and hence vibrate less with respect to the environment, which will ultimately improve the beam projection accuracy.

Furthermore, by engaging the stack approximately halfway at the vertical center of mass of the stack, the moments of inertia for the stack as a whole and about rotation axes in the transversal plane are reduced, which also reduces rotational deflection response of the stack as a whole to externally driven lower frequency torque oscillations.

In the embodiment shown in FIG. 4 , the middle region 75 a of the collimator stack 70 (i.e. the vertical center of mass) is selected to correspond to the middle collimator electrode 75 of the collimator stack 70. Here, the middle electrode 75 is formed by the fifth collimator electrode 75 counted downstream from the source 52 (not shown in FIG. 4 but in FIG. 3 . The preference here for the fifth electrode as the middle electrode (in contrast to e.g. the sixth electrode 76) relates to the additional weights of the thicker first electrode 71 and the source 52 to the stack 70.

The middle collimator electrode 75 comprises an electrode body 92 a that is provided with three stack support protrusions 92 b along the outer electrode perimeter. Radially extending stack support protrusions 92 b along the outer perimeter of the middle electrode 75 provide a robust support construction that may be easily manufactured e.g. via uni-body casting of the middle electrode 75. The electrode body 92 a and protrusions 92 b have sufficient mechanical strength for jointly supporting a total weight W of the collimator electrode stack 70. Each stack support leg 93 is connected to a respective stack support protrusion 92 b.

In alternative embodiments (not shown), the support legs 93 may engage with the spacing structures 89 in the support columns 90 (alternative or in addition to engaging the middle collimator electrode 75) to establish a balanced supporting connection with the external reference frame.

In the embodiment of FIG. 4 , each stack support leg 93 comprises a leg joint 94 for connecting the support leg to the middle stack region 75 a (e.g. to support protrusion 92 b). Furthermore, each stack support leg 93 comprises a leg base 95 for connecting the support leg 93 to the external reference frame. Near the leg base 95, the stack support leg 93 has a triangular support structure with separate leg members 93 a-93 b directed at least partially along opposite angular directions. The leg members 93 a-93 b may be made of mechanically rigid but electrically insulating material. Above and below these leg members 93 a-93 b, each support leg 93 comprises two radial deflection portions 96 a-96 b for allowing the leg joint 94 to displace in the radial direction R with respect to the leg base 95. In the embodiment of FIG. 4 , the radial deflection portions 96 a-96 b comprise beams with a cross-section having a curved I-profile defining a flexible narrow middle region. Each beam is substantially oriented perpendicular to the (local) radial direction, thereby allowing the I-profile to flex only within the local radial-axial plane, while remaining mechanically stiff in the local angular direction. The allowed radial displacements between the leg joints 94 and corresponding leg bases 95 may for example result from radially directed thermal deformation of the middle stack region 75 a (e.g. middle electrode 75) with respect to the leg bases 95 during beam generation. The middle collimator electrode 75 is envisioned to be held at a relatively high positive electrical potential during beam generation, which will result in a large number of secondary/backscattered electrons impacting on this middle electrode 75. The resulting heating will cause radial expansion of the collimator electrode 75, while the external reference frame will not experience such thermal deformation. The differential radial deformation can be efficiently accommodated by the radial deflection portions 96 a, 96 b, and radial tilting of the leg members 93 a-93 b between these deflection portions 96 a, 96 b.

In alternative embodiments (not shown), the support system may also be differently shaped. For example, additional leg segments may be included above and/or below the triangular structures with leg members 93 a-93 b, in order to form e.g. A-shaped support legs. Furthermore, the radial deflection portions 96 a-96 b may be formed differently, e.g. having a different cross-sectional profile.

According to various embodiments, the external reference frame (e.g. carrier frame 42) may support the electrode stack 70 in the middle region 75 a via support members 93 that may be oriented in any of a downward axial direction Z (compression stresses exerted on support legs 93; shown in FIG. 4 ), an upward axial direction −Z (tensile stresses exerted on support members 93; not shown), a radial direction R (bending stresses on support members 93; not shown), or combinations thereof.

FIG. 5 shows a perspective view of an embodiment of an intermediate collimator electrode 72-74, 76-79. The intermediate collimator electrode 72-74, 76-79 is formed by a flat electrode body 81 made of electrically conducting and mechanically rigid material, with a collimator aperture 82 provided at a center of the flat body 81. The collimator aperture 82 is substantially circular as viewed along the axial direction Z, and defines an inner aperture diameter Ø. Furthermore, the circular aperture 82 has a rounded (i.e. a curvedly trimmed) aperture perimeter 82 a, viewed in a cross-section along the angular direction Φ (i.e. a cross-section in an axial-radial plane). The rounded aperture perimeter 82 a helps to avoid high local electric field concentrations along the aperture perimeter 82 a. The rounded aperture perimeters 82 a may be shaped to avoid generation of local electric field strengths above 5 kilovolts per millimeter.

The collimator electrode 71-80 comprises three support portions 86 along an outer electrode perimeter 85. Each support portion 86 is configured to accommodate one spacing structure 89 on one side (e.g. for the first and last electrodes 71, 80) or spacing structures 89 on each side (e.g. for the intermediate electrodes 72, 73, 74, 76, 77, 78, 79).

The spacing structures 89 between the collimator electrodes 71-80 preferably have equal heights Hs along the axial direction Z. Spacing structures 89 with an equal height facilitates manufacturing standardization for the spacers 89, as well as for other structures that are to be attached between collimator electrodes (e.g. intermediate cooling conduits, discussed below). Preferably, a spacer height Hs is smaller than one third of a shortest radial distance ΔR1 from the collimator aperture perimeter 82 a to a lateral surface of a nearby spacer 89. Electric field perturbations at the collimator aperture 82 due to the presence of the spacer structures 89 are thereby reduced to negligible levels.

The collimator electrode 71-80 is provided with three electrode support arms 87 along an outer electrode perimeter 85 of the electrode plate body 81. The three electrode support arms 87 are preferably distributed equally spaced around the outer electrode perimeter 85 (at equal distances along the angular coordinate). The electrode support arms 87 slightly protrude radially along the outer perimeter 85, and extend substantially along the angular direction (D. Each electrode support arm 87 may comprise at least one rigid arm portion 87 a that is connected on one distal end via a flexible arm narrowing 87 b to the outer perimeter 85 of the electrode body 81. Each electrode support arm 87 may be connected on its opposite distal end to a corresponding electrode support portion 86. Each electrode support portion 86 may be formed by a circular platform. A second flexible arm narrowing 87 c may be provided between the rigid arm portion 87 a and the electrode support portion 86. The rigid arm portion 87 a and the flexible arm narrowings 87 b-87 c preferably have a height along the axial direction that is identical or at least comparable to a height of the corresponding collimator electrode, so as to provide sufficient mechanical stiffness/strength for supporting the collimator electrode in the axial direction Z. The narrowing provided in each of the flexible arm narrowings 87 b-87 c is predominantly defined in a direction in the radial-angular plane, and more preferably directed along the (local) radial direction R. In this embodiment, the flexible arm narrowings 87 b-87 c effectively form leaf springs that mainly allow deformation and flexing of the corresponding electrode support portion 86 with respect to the electrode body 81 in the radial-angular plane, while preventing flexing of the corresponding electrode support portion 86 with respect to the electrode body 81 in the axial direction Z. Each electrode support arm 87 defines a thermal expansion slot 88 between the electrode support body 81 and the electrode support arm 87. The thermal expansion slot 88 also extends in the radial-angular plane and substantially along the angular direction (D.

The radially movable arm 87 with its one or more flexible arm narrowings 87 b-87 c as well as the thermal expansion space 88 enable the electrode body 81 to deform (expand/contract) predominantly in the radial-angular plane, and more particularly in the radial direction R, while keeping the support portions 86 axially aligned with corresponding support portions 86 of adjacent collimator electrodes. It is expected that during use of the collimator electrode stack 70, the collimator electrodes 71-80 will be held at different electric potential values, and receive different amounts of (secondary/backscatter) electron radiation and of resulting thermal energy. The movable arms 87 and expansion spaces 88 efficiently accommodate for the varying and different thermally induced radial deformations of the electrodes 71-80 occurring during generation and collimation of the charged particle beam 54, whereby the support columns 90 (see FIG. 4 ) remain mutually aligned along the axial direction Z.

The middle collimator electrode 75 and adjacent intermediate collimator electrodes in the embodiment shown in FIG. 4 are designed to be subjected to large positive electric potentials during beam generation. Also, the last electrode 80 in the stack 70 is designed to be subjected to a considerable electric potential (in the order of +0.5 to +1.5 kilovolts). The resulting considerable attractive forces that any of these electrodes will exert on secondary electrons and backscattered electrons will give rise to a significant electron collision and absorption, and hence to a considerable heat generation. For example, radial expansion of the middle collimator electrode 75 will force the electrode support columns 90 to move radially outward, which will pull the support portions 86 of other collimator electrodes outwards. However, the radially movable support arms 87 provided on the remaining collimator electrodes will accommodate for this radial expansion, thereby keeping all electrodes 71-80 coaxially aligned.

FIG. 6 shows a schematic cross-sectional side view of a collimator electrode stack 70 according to an embodiment. The collimator electrode stack 70 comprises ten collimator electrodes 71-80, wherein the fifth collimator electrode 75 constitutes the middle collimator electrode. The shown cross-section only schematically depicts several characteristic dimensions of this embodiment of the collimator electrode stack 70. Many construction details of this embodiment are omitted for simplicity (for example, detailed shapes of collimator apertures, electrode support portions, and spacing structures are not shown)

In general, the use of multiple collimator electrodes 71-80 separated by spacing structures 89 so as to form a coaxially arranged collimator electrode stack 70 provides the possibility for optimizing the electric field distribution in the collimator stack 70 at different positions along the optical axis A. The step-wise variation of the electric potential differences between at least five adjacent collimator electrodes results in a relatively smoothly varying electric field distribution along the axial direction A. An electrode stack comprising five or more collimator electrodes allows generation of an electric field distribution that may have a plurality of negative electric field minima as well as a plurality of positive electric field maxima, and hence yields sufficient degrees of freedom for generating electric fields that may both collimate a charged particle beam 54 as well as reduce spherical aberrations in the charged particle beam 54. Finding preferred beam characteristics for a particular application is achieved easily with the multi-collimator electrode stack via variation of the applied electrical potential values.

The inventors noted that, in one particular embodiment, the use of ten collimator electrodes 71-80 in a collimator stack 70 provides a good balance between the degrees of freedom for creating a relatively gradual electrical potential distribution along the axial direction Z on one hand, and obtaining sufficient inter-electrode spacing Hd for providing a good line of sight with vacuum pumps 122, 123, sufficient electrode cooling, and constructional simplicity on the other hand.

In the embodiment of the collimator electrode stack 70 shown in FIG. 6 , the intermediate electrode thicknesses He of all the intermediate collimator electrodes 72, 73, 74, 76, 77, 78, 79 are substantially identical. The term “substantially identical” herein refers to intermediate electrode thicknesses He that have the same value within achievable manufacturing tolerances. For collimator electrodes made from aluminum, the intermediate electrode thickness He may be in the range of 10 millimeters to 20 millimeters, preferably in the range of 12 millimeters to 15 millimeters, and more preferably equals 13.6 millimeters. Using intermediate electrodes of equal thickness allows mass production of the electrode bodies and simplifies the assembly of the intermediate collimator electrodes into a collimator stack. In alternative embodiments, all of the electrodes may have identical thicknesses. Yet in other embodiments, some or all of the electrode thicknesses may be different.

An uppermost collimator electrode 71 in the collimator stack 70 (i.e. the collimator electrode 71 that is encountered and traversed first by the charged particle beam 54 upstream of the stack 70 and along the optical axis A) comprises a smaller upper aperture diameter Ø1, followed by a divergently curved aperture bore 71 a. The small upper aperture diameter Ø1 and curved aperture bore 71 a allow a charged particle beam 54 generated by the beam source 52 to experience a gradual electric field change. A first electrode thickness H1 of the first collimator electrode 71 is in a range defined by 1.5·He≤H1≤2.5·He. A first collimator electrode 71 having a thickness in the specified range allows the upstream end (i.e. the top) of the collimator stack 70 to have a smooth transition from a relatively small beam source aperture, to the relatively larger collimator apertures, and allows the first electrode to have sufficient strength for directly supporting a weight of the beam source 52 that is mountable thereon. The term “smooth” is used herein to indicate that a surface (here, the aperture surface) has no abrupt changes in curvature (i.e. sharp ridges, corners, or crevices) at a macroscopic scale. Abrupt curvature changes would generate undesirably large local variations in the electric field.

A middle collimator electrode 75 is provided between the first collimator electrode 71 and the last collimator electrode 80. The intermediate collimator electrodes 72, 73, 74, 76, 77, 78, 79 are located between the first collimator electrode 71 and the last collimator electrode 80, and on both sides of the middle collimator electrode 75. A middle electrode thickness H5 of the middle collimator electrode 75 is in a range defined by 1.5·He≤H5≤2.5·He. Preferably, the middle electrode thickness H5 ties in a range between 22 millimeters to 26 millimeters, and more preferably equals 24 millimeters. A middle collimator electrode 75 having a thickness H5 in the specified range allows the center region 75 a of the collimator stack 70 to have sufficient strength and bending stiffness for preventing the collimator electrode stack 70 from vibrating e.g. about transversal axes (perpendicular to the axial direction Z).

In alternative embodiments, the middle electrode 75 may have a thickness H5 that is substantially equal to the thickness He of the intermediate electrodes 72-74, 76-79. This may for example be achieved by the use of mechanically stronger materials, or in the case that the stack support structure engages other and/or more electrodes in the collimator stack. This is further explained with reference to FIG. 15 .

The last collimator electrode 80 in the collimator stack 70 (i.e. the collimator electrode that is encountered last by the charged particle beam 54) has a radially inner portion 80 a with a last electrode inner thickness H10. The inner thickness H10 lies in a range defined by H10<He/3. The inner thickness H10 of the last electrode 80 preferably has a relatively small value to effectively sustain an electric potential with opposite polarity with respect to the charged particle beam 54 while extending over only a small axial distance. This produces a highly localized attractive E-field near the aperture perimeter. The thin last electrode 80 with opposite polarity produces negative spherical aberration for a beam of charged particles, to compensate for positive spherical aberrations in the beam that have been generated in the preceding part of the collimator stack 70.

The last collimator electrode 80 has a last electrode outer thickness H10′ at a radially outer portion 80 b. The last electrode outer thickness H10′ preferably equals the intermediate electrode thickness He, to make the last electrode 80 mechanically stronger, and also to provide sufficient height for accommodating a cooling conduit inside the outward portion. As shown in FIG. 6 , the transition from the inner portion 80 a to the outward portion 80 b may involve an axial stepwise increase from inner thickness H10 to outer thickness H10′. This creates an inner aperture diameter Ø10 for the radially inner portion 80 a, and an outer aperture diameter Ø10′ for the radially outer portion 80 b. According to a preferred embodiment, the inner body thickness H10 of the last collimator electrode 80 is in a range of 5 millimeters or smaller, the outer body thickness H10′ is in a range of 10 millimeters or larger, the inner aperture diameter Ø10 is 60 millimeters, and the outer aperture diameter Ø10′ is 100 millimeters.

Downstream of the last electrode 80, there is provided an aperture array 58 for forming a plurality of beamlets from the charged particle beam 54. The aperture array 58 may be a structural component of the collimator electrode stack 70. Alternatively, the aperture array 58 may form part of a condenser lens module 56 that is arranged in the projection column 46 directly downstream from the beam generator module 50 (as viewed along the optical axis A). The aperture array 58 comprises a lower central surface and slanted lateral surfaces. During operation, the aperture array 58 is preferably kept at ground potential. The shape of the aperture array 58 creates sufficient distance between the inner perimeter of the (relatively) thin radially inner electrode portion 80 a of the last collimator electrode 80, to avoid electrical discharging between the (sharp edges of the) charged last collimator electrode 80 and the aperture array 58. The shape of the aperture array 58 also ensures that the spacing between the aperture array 58 and the radially outward electrode portion 80 b of the last collimator electrode 80 is kept small, to preserve the vacuum inside the collimator electrode stack 70 with respect to the region outside the beam generator module 50 and/or outside the condenser lens module 56.

FIG. 6 helps to illustrate exemplary methods for operating this embodiment of the collimator electrode stack 70 during beam generation and processing. In this embodiment, the collimator electrodes 71-80 are positioned at equal distances Hd along the optical axis A in a coaxial arrangement.

In other embodiments, the collimator electrodes may be positioned at different inter-electrode distances. See for example the embodiments discussed with reference to FIGS. 9-11 .

Different electrostatic potential values (i.e. voltages) are applied to the collimator electrodes 71-80. The collimator electrode stack 70, the charged particle beam generator 50, or the charged particle lithography system 10 may comprise a set of distinct voltage sources 151-160. Each voltage source 151-160 comprises an output terminal for applying a selected electric potential to a respective collimator electrode 71-80. An electric connection is provided between the output terminal of each voltage source 151-160 and the electrical contact 109 of a corresponding collimator electrode 71-80. Preferably, the voltage sources 151-160 are independently and dynamically adjustable during operation of the beam generator 50. Alternatively, the voltage sources 151-160 may be formed as a single power supply with suitable adaptors and dividers to convert its output(s) to distinct selected voltage values to be applied to the corresponding collimator electrodes 71-80.

Below, is a table of two numerical simulations (one per column), which corresponds to a preferred arrangement for the collimator electrodes, and to two preferred electric potential distributions applied to the electrodes 71-80. The sequence of electrode numbers in the table corresponds to the sequence of collimator electrodes 71-80 as used in the description with reference to e.g. FIGS. 4 and 6 .

V-distribution V-distribution 2 Electrode # 1 (along Z) (along Z) 71 0 V 0 V 72 −3165 V −3649 V 73 5577 V 3907 V 74 23160 V 19140 V 75 29590 V 21990 V 76 17400 V 9651 V 77 4870 V 1525 V 78 698 V −313.5 V 79 52 V −491.9 V 80 1023 V 702.2 V

The listed electric potential values for the various electrodes correspond to potential differences with respect to ground potential. Each of the electric potential values may be applied to the collimator electrodes 71-80 by the corresponding voltage source 151-160. During operation, the aperture array 58, which is located directly downstream of the last collimator electrode 80, is preferably kept at ground potential. A method for operating a charged particle beam generator 50 may comprise:—generating an electron beam 54 with the beam source 52;—projecting the generated electron beam along an optical axis A through the apertures 82 of the collimator electrode stack 70;—applying electrical potentials onto the collimator electrodes 71-80, comprising:—keeping a first collimator electrode 71 at ground potential;—keeping a middle collimator electrode 75 at a highest positive electric potential, and—keeping a last collimator electrode 80 at a low positive electric potential.

The electric potential differences applied across the collimator electrodes serve to produce a homogeneous transversal electron beam surface current density, while reducing the angular error. During beam generation, the electron beam 54 emanates from the beam source 52 with a locally diverging contour as viewed in a cross section in a radial-axial plane.

The strongly increasing electric potential values applied to the third, fourth, and fifth collimator electrodes 73-75 creates a local electric field distribution that acts as a positive lens on the traversing electron beam 54. This serves to refract the local contour of the electron beam 54 in the radial-axial cross-section towards the optical axis A, and causes the distribution of the electron beam 54 to converge. Due to the radial variation of the electric field strength in the radial-angular plane, the positive lens effect may cause the electrons in the electron beam 54 to obtain a non-uniform axial speed distribution as viewed in the radial-angular plane (which causes for spherical aberration effects).

The strongly decreasing electric potential values applied to the sixth, seventh, eighth, and ninth collimator electrodes 76-79 create a local electric field distribution that acts as a negative lens on the traversing electron beam 54. This also refracts the local contour of the electron beam 54 in the radial-axial cross-section, but now away from the optical axis A. The variations in the radial distributions of the electron beam and the electric field may again contribute to spherical aberration effects.

A positive electric potential (with respect to a grounded reference) applied to the last collimator electrode 80 produces negative spherical aberration in the traversing electron beam 54 (or for a beam of negatively charged particles in general). The generated negative spherical aberrations will (at least partially) compensate any positive spherical beam aberration that has been generated in the preceding part of the collimator stack 70.

The voltage sources 151-160 are preferably set to create electric potentials on the collimator electrodes 71-80 so that a final local contour of the electron beam 54 is properly collimated as it emanates downstream from the beam generator 50 (i.e. the beam is made parallel in the radial-axial cross-section, at least as much as possible). The electric potentials created by the voltage sources 151-160 may be dynamically adjusted, in order to alter the distribution of the electrical potential values along the axial direction and/or to alter the local amplitudes of the electric fields. The axial centers of the positive and negative lenses may thus be moved along the axial direction, and/or the field amplitudes changed. The independent adjustability of the electric potentials applied to the collimator electrodes 71-80 during operation facilitates reconfiguration and optimization to changing operational conditions (e.g. beam current, vacuum conditions, shielding conditions, etc.)

The method may further comprise:—keeping a second collimator electrode 72 preceding the middle electrode 75 at a negative electric potential. In addition, the method may also comprise—keeping at least one of two intermediate collimator electrodes 78, 79 directly preceding the last collimator electrode 80 at low negative electric potentials. Applying a negative electric potential at one or two of the last intermediate collimator electrodes 78-79 preceding the last collimator electrode 80 helps to deflect secondary electrodes and/or backscattered electrodes originating from a region downstream of the collimator electrode stack 70. Secondary electrons may for example be created during collisions of primary electrons in the electron beam 54 with the aperture array 58. The local negative electric potential helps to reduce the number of electrons that impact on the strongly positively charged middle collimator electrode 75.

According to the above mentioned specific numerical examples, further embodiments of the method for operating a beam generator 50 may comprise:—keeping at least one of two intermediate collimator electrodes 78, 79 directly preceding the last collimator electrode 80 at a fixed electric potential with a value of −300 Volts to −500 Volts;—keeping the second collimator electrode 72 at a fixed electric potential with a value of −3 kilovolts to −4 kilovolts;—keeping the middle collimator electrode (75) at a fixed electric potential with a value of +20 kilovolts to +30 kilovolts, and—keeping a last collimator electrode 80 at a positive potential in a range of +500 Volts to +1100 Volts.

FIGS. 7 a-7 d show cross-sectional top and side views of collimator electrodes 71-80 according to embodiments. The shown collimator electrodes 71-80 are provided with a cooling conduit 105 for transferring a cooling liquid 102, the cooling conduit 105 comprising a first opening 103 for connection to a liquid supply structure 117, and a second opening 104 for connection to a liquid discharge structure 118.

The presence of a cooling conduit 105 may further improve the accuracy and reliability of electric field control, as thermally induced deformation of the collimator electrode 71-80 may be regulated. The cooling conduit 105 may reduce expansion of the collimator electrode 71-80 due to thermal heating, for example caused by exposure to scattered and/or secondary electrons. Electrical conductance within the cooling liquid 102 is to be minimized, to avoid electrical charge accumulated on at least one of the collimator electrodes to be transported toward other collimator electrodes in quantities that are sufficiently large to alter the electrical potentials applied to the electrodes. Although more powerful charge sources may be used to compensate for any charge transport via the cooling liquid, such charge dissipation is less desirable due to the resistive heating from the resulting current through the cooling liquid, which negatively influences the liquid's cooling capacity. Electrical separation may be achieved by using ultra-pure water (UPW) or non-conducting oil as a cooling liquid. Preferably, UPW is constantly or intermittently filtered during operation of the particle beam generator 50.

As shown in FIGS. 7 a-7 d , the collimator electrodes comprise a ring-shaped electrode body 81 (primes for the various embodiments are implied wherever applicable) provided with a top surface 83 facing the charged particle source 52, and a bottom surface 84 facing away from the charged particle source 52. The bottom surface 84 and top surface 83 are connected to each other via a side surface 85, which defines an outer electrode perimeter. The first opening 103 and the second opening 104 are located in the side surface 85. Locating the first opening 103 and the second opening 104 of the cooling conduit 105 in the side surface 85 helps to keep the space between the different collimator electrodes 71-80 in the stack 70 free from potentially interfering (i.e. electric field perturbing) structures. In particular, since the cooling liquid supply and/or removal occur from a lateral side of the electrodes 71-80, the liquid supply structure 117 and/or liquid removal structure 118 do not need to occupy any space between the collimator electrodes 71-80.

The first opening 103 and the second opening 104 are located at the same side of the collimator electrode 71-80. Locating the first and second openings 103, 104 at the same side allows for placement of both the cooling liquid supply structure 117 and the cooling liquid discharge structure 118 at the same side of the collimator stack 70, which provides more space for other components to be placed alongside/around the collimator stack 70.

The cooling conduit 105 connects the first opening 103 with the second opening 104 along a trajectory running through the electrode body 81 around the electrode aperture 82. The cooling conduit 105 comprises a substantially circular portion 105 a around the aperture 82 and two substantially straight end portions 105 b for connecting the circular portion 105 a with the first opening 103 and the second opening 104. This arrangement is particularly favorable if the electrode aperture 82 is a circular aperture. Here, the substantially circular conduit portion 105 a traces out a trajectory at a constant distance from the aperture perimeter 82 a, which results in more homogeneous cooling of the center portion of the collimator electrode 71-80.

The cooling conduit 105 is formed by a tubular structure, with tube openings 103, 104 that are oriented in radial directions. A relatively strong thermally and electrically conductive material is preferred as construction material for the cooling tube. Titanium for example, is a strong metal non-magnetic metal. A titanium cooling tube 105 provided in/on the collimator electrode body 81 will not generate significant magnetic field disturbances or magnetic stresses in response to the flux of the (nearby) charge particles travelling along the optical axis. Furthermore, titanium has a relatively high melting temperature (about 1940 Kelvin), which makes it a very suitable metal for manufacturing cooling conduits 105 inside a collimator electrode, by casting the collimator electrode body 82 from a metal of a substantially lower melting point (e.g. aluminum, having a melting temperature at about 930 Kelvin) around the titanium cooling tube 105. Alternatively, molybdenum may be used as a material for constructing the cooling tubes.

The cooling tube 105 may have a circular cross section, for achieving a relatively homogeneous liquid flow inside. An outer diameter of such a circular cooling tube 105 may be in the range of 0.6 centimeter to 1 centimeter, and a corresponding inner diameter in the range of 0.4 centimeter to 0.8 centimeter.

As shown in FIG. 7 a , the conduit tube 105 may be integrated (e.g. cast) within the body 81 of the collimator electrode 71-80. Integral formation improves the cooling efficiency. Furthermore, by integrating the tubes within the electrode, the tubes will not protrude from the body surface and create local electric field concentrations, which would otherwise perturb the desired field distribution across the electrode aperture 82. The probability for sparking between the electrodes 71-80 is also reduced (which would not be the case for conduit tubes positioned on top of or protruding from the electrode surface). Moreover, having conduit tubes 105 integrated within the collimator electrode body 81 will increase the lateral space (i.e. mean free path) available for free molecules moving in the collimator stack 70 to travel radially outward and be removed e.g. absorbed by getter pumps 122, 123 positioned radially outward at a distance from the collimator stack 70. In the case that thermal heat transfer efficiency between the collimator electrode and the cooling liquid 102 has to be maximized, it is preferred that the electrode is formed via casting of electrode material around the cooling conduit 105.

The circular portion 105 a the conduit tube 105 is preferably located at a sufficient radial conduit distance ΔR2 away from the aperture perimeter 82 a of the electrode aperture 82. This ensures that the cooling effect of the cooling liquid 102 flowing through the circular portion 105 a of the cooling conduit 105 stays relatively homogeneous along the angular coordinate (i.e. the temperature difference between the inflowing liquid and outflowing liquid stays relatively small), so that the differential thermal expansion of the electrode body 81 stays roughly the same as a function of the angular coordinate.

For example, for collimator stack embodiment with aluminum collimator electrodes (with a typical bulk thermal conductivity of 237 Watts per meter Kelvin) comprising electrode apertures 82 with an aperture diameter Ø of about 60 millimeters, which have an electrode thickness of about 13.6 millimeters, which accommodate a flow of water as cooling liquid, and in which at least one of the collimator electrodes is heated up with a temperature increase of up to 60° C. during operation, the radial conduit distance ΔR2 is preferably chosen to be 20 millimeters or larger. Note that in this example, a typical total diameter of the circular conduit portion 105 a will be 100 millimeters or larger.

Alternatively, as shown in FIG. 7 c , the conduit tube 105 may be accommodated inside a recess 106 provided in the electrode body 81′ on a top side 83′ thereof. Milling a recess 106 into the electrode body 81′ and placement of the conduit tube 105 therein is a relatively cheap method for manufacturing a electrode. A thermally conducting adhesive material 107 may be provided in the recess 106 around the cooling tube 105, in order to fix the tube to the electrode body 81′ and increase the effective thermal transfer interface. Attaching the conduit tube in the recess will also reduce local mechanical resonances propagating along the tube 105.

In yet another embodiment, which is shown in FIG. 7 d , the conduit tube 105″ may have a rectangular outer cross section, i.e. a rectangular outer perimeter as viewed in a cross-section along the radial-axial plane. This conduit tube 105″ is also accommodated inside a recess 106′ provided inside the electrode body 81″ and with an opening on a top side 83′ thereof. The recess 106′ is provided with a complementary rectangular contour in an (axially) inner portion of the recess, to accommodate the rectangular conduit tube 105″ in a manner that improves the thermal contact between lower and lateral sides of the conduit tube 105″ on the one hand, and the lower and lateral sides of the recess 106′ on the other hand. In this embodiment, the conduit tube 105″ comprises a lower gutter portion 105 c with a curved inner void for accommodating the cooling liquid 102″, and a flat upper lid portion 105 d for closing the curved inner void in a sealing manner (e.g. by laser welding the upper lid portion 105 d onto upright lateral walls of the lower gutter portion 105 c). An (axially) outer portion of the recess 106′ may have a fillet (rounded) shape, to facilitate insertion of the conduit tube 105″ into to recess 106′.

In any of the embodiments, intermediate conduits (e.g. tubular elements) 110 are provided for connecting a second opening 104 of a collimator electrode with a first opening 103 of a subsequent collimator electrode of the electrode stack 70. Using intermediate tubular elements 110 provides the ability to cool more than one collimator electrode within the collimator stack 70, while only a single cooling liquid supply structure 117 and cooling liquid removal structure 118 are needed for supply and removal of cooling liquid respectively. If more than one collimator electrode of the collimator electrode stack 70 is to be cooled, this embodiment is relatively easy to implement.

In the embodiment of FIG. 3 , the intermediate tubular element 110 is made of an electrically insulating material e.g. aluminum oxide. This prevents the electrodes (between which a liquid connection is established) from becoming electrically connected (i.e. becoming electrical equipotential surfaces). Such electrical connection would counteract the initial purpose of having distinct electrodes. In alternative embodiments, the intermediate tubular elements may comprise portions made of electrically conducting material and coupling portions made of electrically insulating material (see e.g. FIG. 14 ).

In the embodiment shown in FIG. 3 , the cooling conduits 105 in the collimator electrodes 71-80 are connected in series, to convey the cooling liquid sequentially through subsequent collimator electrodes 71-80. The supply conduit opening 103 of the last collimator electrode 80 is connected to a cooling liquid supply tube 117, for conveying the cooling liquid into the collimator stack 70. The discharge conduit opening 104 of the first collimator electrode 71 is connected to a cooling liquid discharge tube 118, for conveying the cooling liquid out of collimator stack 70. A cooling liquid pump 116 (with a heat extraction means) is provided on an outside of the beam generator chamber 51. The supply tube 117 and discharge tube 118 penetrate the beam generator chamber 51 at a predetermined location and in an air-tight manner. On the outside of the beam generator chamber 51, the supply tube 117 and discharge tube 118 are coupled with supply and discharge ports (not indicated) of the cooling liquid pump 116. On the inner side of the beam generator chamber 51, the supply tube 117 and the discharge tube 118 are provided with further bellow structures 119 for damping motional fluctuations, so as to prevent transient forces and mechanical resonances from the outer side to be conveyed via the supply and discharge tubes 117, 118 to the collimator stack 70. Preferably, the further bellow structures 119 are shorter than a tube diameter, to effectively attenuate vibrations.

According to the shown embodiment, the cooling liquid is preferably initially pumped into the collimator stack 70 at the downstream region (i.e. supplied to the last electrode 80), and the heated cooling liquid is pumped out of the collimator stack 70 at the upstream region (i.e. discharged from the first electrode 71). This arrangement produces a net flow of the cooling liquid along the negative axial direction −Z. In many applications, collimator electrodes located downstream of the electrode stack 70 are subject to more collisions and absorption of backscattered and/or secondary electrons, which results in a higher heat load. Initial supply of the cooling liquid to the downstream electrodes, and subsequently conveying the (warmed up) cooling liquid to the more upward electrodes, is preferred here to provide a more efficient heat exchange between the heated electrodes and the cooling liquid.

Also shown in FIG. 3 is that the intermediate tubular element 110 comprises a first substantially straight portion 111 radially facing away from the first opening 103, a second substantially straight portion 112 radially facing away from the second opening 104, and a substantially curved portion 113 connecting the first straight portion 111 with the second straight portion 112. An intermediate tubular element 110 comprising these straight portions 111, 112 and curved portion 113 in between reduces the risk of buckling, and more securely guarantees continuous transfer of cooling liquid through the intermediate tubular element 110. The intermediate tubular element 110 may be provided with at least one bellows structure 114. The bellows 114 enables motional compensation for any differential thermal deformations between the collimator electrode and the adjacent collimator electrode. Inhomogeneous heating of these electrodes and the resulting deformation differences will not result in exertion of additional stresses between the electrodes via the intermediate tubular element 110. The bellows structure 114 also assist in damping/eliminating mechanical vibrations that are coupled into the collimator stack 70.

FIG. 8 shows a detailed top view of a beam generator according to an embodiment. This beam generator may comprise the charged particle source 52 and collimator stack 70 as discussed herein above.

The charged particle beam generator 50 is accommodated inside a beam generator vacuum chamber 51. The charged particle beam generator 50 comprises at least one vacuum pump unit 122, 123 provided at a distance ΔR from an outer perimeter of the collimator electrode stack 70. The vacuum pump unit 122, 123 forms an elongated structure with a pumping aperture 122 a, 123 a that is directed parallel with the optical axis, and which has an aperture height Hp that spans at least part of the collimator height.

In the embodiment of FIG. 8 , the beam generator chamber 51 is provided with at least two vacuum pump units 122, 123, for sustaining a low vacuum inside the generator chamber 51 and the collimator stack 70 during operation. The vacuum pump units 122, 123 are provided at radial distances ΔR from the outer perimeter of the collimator electrode stack 70. The number of vacuum pump units may be increased to e.g. three or four, depending on the expected inflow of gas molecules from the environment into the beam generator chamber 51. The vacuum pump units 122, 123 sustain the vacuum by removing molecules travelling through the beam generator chamber 51. The pumping units 122, 123 may for example comprise two getter pumps, which remove free moving gas molecules from the beam generator chamber 51 via chemical reaction or surface adsorption.

Active pumping surfaces 122 a, 123 a of the pumping units 122, 123 extend along a substantial portion or preferably along the entire height He of collimator stack 70. A positioning of the pumping units 122, 123 with respective pumping surfaces 122 a, 123 a extending substantially along the height He of the collimator stack 70 yields a saving of the space within the beam generator chamber 51. The pumping apertures 122 a, 123 a preferably face the outer collimator perimeter (which is delineated by the outer perimeters 85 of the collimator electrodes 71-80).

The collimator electrode stack 70 comprises the three support columns 90 with the support portions 86. Each support column 90 (e.g. its support portions 86) extends over a respective angular range ΔΦ1, ΔΦ2, ΔΦ3 along the outer electrode perimeter 85. The pumping apertures 122 a, 123 a of the pumping unit 122, 123 each spans an angular pump range ΔΦp that has no overlap with either of the three angular ranges ΔΦ1, ΔΦ2, ΔΦ3. The shown configuration provides a good pumping efficiency.

The electrode stack 70 may comprise collimator electrodes 71-80 with cooling conduits 105 provided therein (i.e. “coolable collimator electrodes”). In this case, the electrode stack 70 also comprises intermediate tubular elements 110 for connecting a second opening 104 of a first collimator electrode with the first opening 103 of an adjacent collimator electrode. The intermediate tubular elements 110 are provided at the outer electrode perimeters 85, spanning a tube angular range ΔΦt. In addition to the above angular positioning properties for the pumping units 122, 123, the angular pump ranges ΔΦp of the pumping apertures 122 a, 123 a also have no overlap with the tube angular range ΔΦt.

FIG. 9 shows a perspective view of a beam generator 50′ according to another embodiment. Features and effects relating to the collimator electrode stack 70 described above (in particular with reference to FIGS. 3-8 ) may also be present in the embodiment of the collimator electrode stack 70′ shown in FIGS. 9-13 , and will not all be discussed here again. In the discussion of the beam generator 50′ embodiment in FIGS. 9-13 , similar reference numbers are used for similar features, but indicated by a prime to distinguish the embodiments.

The beam generator 50′ in FIG. 9 comprises a collimator electrode stack 70′ and a beam source vacuum chamber (or “source chamber”) 53′ enclosing a beam source 52′ for generating a charged particle beam along an optical axis A′. The optical axis A′ extends along an inner part of the collimator electrode stack 70′.

The collimator electrode stack 70′ comprises ten collimator electrodes 71′-80′, each having an electrode aperture 82′. The electrode apertures 82′ are coaxially aligned along the optical axis A′, and configured for electrically manipulating an electron beam that propagates substantially parallel with the axial direction Z′ along the optical axis A′.

The first collimator electrode 71′ is provided at an upstream end of the collimator stack 70′. The beam source 52′ is fixed further upstream on or near an outer face of the first collimator electrode 71′ (see FIG. 11 ). Each of selected collimator electrodes 71′-74′, 76′-80′ comprises three support portions 86′ along an outer electrode perimeter. The support portions 86′ accommodate spacing structures 89′ on one side facing the axial direction Z′. The support portions 86′ may further accommodate another spacing structure 89′ on the opposite side facing the negative axial direction −Z′. The spacing structures 89′ are electrically insulating and resistant against mechanical compression. The spacing structures 89′ may be formed as cylindrical objects with a uniform spacer height and flat end surfaces that support or are supported by the electrode support portions 86′ of adjacent electrodes 71′-74′, 76′-80′.

In the shown embodiment, three such spacing structures 89′ are arranged between each adjacent pair of electrodes. Preferably, three spacing structures 89′ form a tripod configuration. The spacing structures 89′ are located at substantially equal radial distances away from the optical axis A′, and are mutually spaced at angular distances of about 180° degrees about the optical axis A′. The arrangement of spacing structures 89′ and support columns 90′ is further explained below, with reference to FIG. 13 .

The collimator electrode stack 70′ comprises three stack support legs 93′. Each support leg is connected to a middle region 75 a′ of the collimator stack 70′ with respect to the axial direction Z′. The support legs 93′ cooperate to support the collimator stack 70′ with respect to an external reference frame, which may be formed by the carrier frame 42 of the charged particle lithography system 10 in FIG. 1 . The resonance regularization effects described for the collimator electrode stack of FIG. 4 are also achievable by the currently described collimator configuration.

The middle region 75 a′ of the collimator stack 70′ is selected to correspond to the middle collimator electrode 75′, which in this case is the fifth collimator electrode 75′ counted downstream, starting from the source 52′ and proceeding along the axial direction Z′. The middle collimator electrode 75′ comprises an electrode body formed by a mechanically strong triangular slab with three corners 92 b′ and three intermediate electrode body edges 92 c. Each corner 92 b′ accommodates a spacing structure 89′ on one side towards the axial direction Z′ and another spacing structure 89′ on the opposite side towards the negative axial direction −Z′.

Each stack support leg 93′ is connected to a respective electrode body edge 92 c. In the embodiment of FIGS. 9-11 , each stack support leg 93′ comprises a radially protruding tripod 93 a′-96 c′ that is connected to the collimator stack 70′ in three distinct regions. The stack support leg 93′ comprises a leg base 95′ with a support foot 99 for connecting the support leg 93′ to the external reference frame. The stack support leg 93′ comprises first and second leg members 93 a′-93 b′ that extend radially inward and in locally opposite angular directions from the leg base 95′ towards the middle stack region 75 a′. The stack support leg 93′ comprises two leg joints 94 a′-94 b′ for connecting the first and second leg members 93 a′-93 b′ to the middle stack region 75 a′, e.g. to a corresponding electrode body edge 92 c′ of the fifth electrode 75′. In this embodiment, the leg joints 94 a′-94 b′ are level with an upper surface of the electrode body, to conserve the angular symmetry of the electric field generated by the fifth electrode 75′.

Each stack support leg 93′ may also comprise a third leg member 93 c that extends from the leg base 95′ towards one of the lowermost electrodes 79′-80′ in the electrode stack 70′.

The leg members 93 a′-93 c are preferably made of mechanically rigid material. At least an intermediate portion of each leg member 93 a′-93 c′ is essentially made of electrically insulating material, to electrically insulate the supported electrodes from each other as well as from the leg base 95′. Each of the first and second leg members 93 a′-93 b′ comprises a radial deflection portion 96 a′-96 b′, which is configured for allowing the corresponding leg joint 94 a′-94 b′ to displace in the radial direction R′ with respect to the leg base 95′. In the embodiment of FIG. 9 , the radial deflection portions 96 a′-96 b′ comprise beams with a curved I-shaped cross-section, which defines a flexible narrow middle region. Each I-beam is oriented mainly transverse to the (local) radial direction, and allows the I-profile to flex within the (local) radial-axial plane while remaining mechanically stiff in the (local) angular direction.

As shown in FIG. 10 , the leg base 95′ is connected to the support foot 99, which comprises a first support foot portion 99 a and a second support foot portion 99 b. The support foot portions 99 a-99 b form distinct bodies that are moveably arranged with respect to each other. The support foot portions 99 a-99 b may be interconnected by a resilient member 100 positioned between the first support foot portion 99 a and the second support foot portion 99 b. The resilient member 100 permits the first and second foot portions 99 a-99 b to mutually displace within a predetermined range. The resilient members 100 may for example be formed by two leaf springs 100 a-100 b that both extend parallel with the axial direction Z′ and the (local) angular direction Φ′. The two leaf springs 100 a-100 b are oriented mutually parallel at different radial distances from the optical axis A′. Each leaf spring faces substantially towards the radial direction R′ (i.e. has its sheet surface normal pointing at least partially in the radial direction R′). Each of the leaf springs 100 a-100 b of one support foot 99 separately allows resilient flexing along radial-axial directions. The leaf springs 100 a-100 b jointly allow the first foot portion 99 a and the second foot portion 99 b to elastically flex along the radial direction R′ in a parallelogram fashion. This allows the first foot portion 99 a to retain its orientation during radial flexing with respect to the second foot portion 99 b (and the external reference frame). The leaf springs 100 a-100 b may for example be constructed of sheet steel.

The described stack support configuration allowed radial displacements between the leg joints 94 a′-94 b′ and the corresponding leg bases 95′ of each stack support leg 93′, as well as radial displacements between the first foot portion 99 a and the second foot portion 99 b of each stack support leg 93′. The cooperating three stack support legs 93′ yield a stack support configuration that may conveniently accommodate differential radial deformation of the middle electrode 75′ with respect to the leg bases 95′, while keeping the collimator electrode stack 70′ aligned along the optical axis A′.

The support foot 99 may comprise one or more adjustment members 99 c for fine-tuning a height of the corresponding support leg 93′. By separately varying the support heights of the three support legs 93′, the total height and tilt of the collimator stack 70′ with respect to the external frame 42 may be accurately adjusted.

The leg base 95′ may also comprise a gasket 98 that cooperates with a surrounding beam generator chamber 51′ in a manner described herein further below.

In the embodiment of FIGS. 9-13 , the source vacuum chamber 53′ encloses the beam source 52′.

The source vacuum chamber 53′ is formed by chamber walls with a cross-section defined in the radial-angular plane that has a predominantly triangular shape with three chamfered corners. The resulting irregular hexagonal cross-sectional shape of the walls of the vacuum source chamber is arranged in such a manner that the three chamfered wall corners are aligned with the three support columns 90′ of the underlying collimator stack 70′. The collimator electrode stack 70′ and the source vacuum chamber 53′ are not directly mechanically connected. Similarly, the beam source 52′ and the source vacuum chamber 53′ are not directly mechanically connected. Instead, the first collimator electrode 71′ comprises engagement members for fixing the charged particle beam source 52′ to the first collimator electrode 71′ on an upper side thereof, and source alignment members for orienting the optical axis A′ of the generated charged particle beam with a centerline of the electrode apertures 82′.

Each stack support leg 93′ comprises two chamber support members 101 for aligning and supporting the source vacuum chamber 53′. Is this embodiment, each chamber support member is formed by an elongated support rod 101, which extends from a leg connection 101 a at the corresponding leg base 95 towards a chamber connection 101 b that locally supports the source chamber 53′. At least one narrowing 101 c may be provided along the support member 101, to accommodate thermal differential expansion. The embodiment shown in FIGS. 9-10 comprises six such support rods 100, which extend upwards and radially inwards.

The support configuration shown in FIG. 9 allows the beam source chamber 53′ and the collimator electrode stack 70′ to be supported on the same external reference frame 42 via the same support structure 93′-101 c, while avoiding direct mechanical coupling between the beam source chamber 53′ and the collimator electrode stack 70′. This support configuration may advantageously reduce effects of pressure-induced deformations in the beam source chamber 53′ on the alignment of the collimator stack 70′. Conversely, the support configuration may advantageously reduce effects of thermally induced deformations of the electrode stack 70′ on the geometry of and vacuum conditions inside the source chamber 53′. Alternatively or in addition, the proposed support configuration mechanically decouples the extra weight and size of the source chamber 53′ from the collimator electrode stack 70′, thereby reducing or even eliminating the contribution of the source chamber 53′ to the mechanical resonance (eigen-)frequencies of the collimator electrode stack 70′. The resulting mechanical resonance frequencies for the collimator stack 70′ thus become higher and more localized in frequency space. The proposed support configuration for decoupling the source vacuum chamber 53′ and the electrode collimator stack 70′ may be implemented as a separate improvement, independently from the mechanical decoupling solution between the electrode collimator stack 70′ and the beam generator vacuum chamber 51′, which is discussed directly below.

FIGS. 10-11 show perspective views of the beam generator embodiment 50′ including a beam generator vacuum chamber (or “generator chamber”) 51′ and vacuum pumping systems. Features and effects relating to the beam generator 50 with generator chamber 51 in FIG. 8 may also be present in the beam generator 50′ with generator chamber 51′ described below, and will not all be discussed here again. In the discussion of the embodiment in FIGS. 10-11 , similar reference numbers are used for similar features, but indicated by a prime to distinguish embodiments.

The beam generator vacuum chamber 51′ is only partially shown in FIGS. 10-11 . In FIG. 10 , only a rear chamber portion 51 a and a lower chamber portion 51 b of the beam generator chamber 51′ are depicted. An upper chamber portion and lateral chamber portions form part of the complete beam generator chamber 51′, but are omitted from FIG. 10 to show the charged particle beam generator 50′ inside the generator chamber 51′. Lateral chamber portions 51 c-51 e of the generator chamber 51′ are depicted in FIG. 11 .

The beam generator vacuum chamber 51′ is provided with vacuum pump units 122′-123′ (e.g. getters) for sustaining a low vacuum inside the generator chamber 51′ during operation. The vacuum pumps 122′-123′ are attached to a pump support structure 124, and oriented with their body axes substantially parallel with the axial direction Z. The pump support structure 124 has curved surface portions that face substantially towards the collimator stack 70′ (viewed along the radial direction R). The vacuum pumps 122′-123′ are attached on a surface portion of the pump support structure 124 that faces substantially away from the collimator stack 70′. The electric shielding by the pump support structure 124 and the outward direction of the vacuum pumps 122′-123′ help to reduce the perturbing effects of e.g. the polygonal shape of the vacuum pumps 122′-123′ on the electric fields created inside the collimator stack 70′.

Each support column 90′ of the collimator electrode stack 70′ extends over a respective angular range ΔΦ1′, ΔΦ2′, ΔΦ3′ along the outer electrode perimeter. Only the range ΔΦ1′ is shown in FIG. 11 . The configuration with clamping members 91 a′-91 b′ inside aligned through holes in each support column 90′ advantageously reduces a column width and therefore also the angular range ΔΦ1′, ΔΦ2′, ΔΦ3′ over which each support column 90′ extends. The reduced column width yields a larger window for molecules inside the collimator region to travel without obstruction towards the vacuum pump units 122′-123, resulting in a higher pumping efficiency.

Below, a mechanical decoupling mechanism between the collimator electrode stack 70′ and the beam generator chamber 51′ is described.

As viewed along the axial direction A′, the stack support legs 93′ of the collimator electrode stack 70′ extend radially outward and protrude beyond an outer perimeter of the collimator electrodes 71′-80′. Also viewed along the axial direction A′, the lower vacuum chamber portion 51 b of the generator chamber 51′ delineates an outer chamber perimeter 130 that extends beyond the outer perimeter of the collimator electrodes 71′-80′ (provided that the collimator electrode stack 70′ is positioned inside the generator chamber 51′). At the angular coordinates of the stack support legs 93′, the outer chamber circumference 130 is “inscribed” with respect to the stack support leg bases 95′ (i.e. the outer chamber perimeter 130 locally lies at a smaller radial distance from the optical axis A′ than the leg bases 95′ do).

To accommodate the protruding stack support legs 93′, the lower vacuum chamber portion 51 b is provided with three lateral chamber apertures 132 in the chamber wall. The chamber apertures 132 are located at angular coordinates that correspond with the respective stack support legs 93′. Preferably, each lateral chamber aperture 132 has a shape that is complementary to a local outer perimeter of a corresponding support leg 93′. In the embodiment of FIG. 10 , each lateral chamber aperture 132 has a predominantly rectangular shape to accommodate a corresponding leg base 95′ with a locally rectangular cross-section. The lateral chamber apertures 132 are preferably shaped similar to (i.e. congruent with) the local perimeters (cross-sections) of the corresponding support legs 93′, but other aperture shapes are possible, provided that the (local perimeter of the) support leg can be accommodated and that the support leg is allowed to protrude through the chamber wall while avoiding direct rigid connection with the wall of the generator chamber 51′.

As described herein above, the stack support members 93′ may each comprise a gasket 98 for connecting to the surrounding generator chamber 93′. The gasket 98 is arranged and configured to flexibly connect the corresponding stack support member 93′ to the lower vacuum chamber portion 51 b along the edge of the lateral chamber aperture 132. In addition, the gasket 98 is formed to cover and seal a void between the lateral chamber aperture 132 and the support leg 93′. The resulting sealing configuration allows different vacuum conditions to be applied on both sides of the lateral chamber aperture 132 (i.e. on the inside and outside of the generator chamber 51′). In the embodiment of FIGS. 10-11 , the gasket 98 of each stack support member 93′ is formed by a flat rectangular washer made of synthetic rubber (more particularly, a vacuum-compatible fluoropolymer elastomer like Viton®), which surrounds the leg base 95′ of the stack support member 93′.

The resulting beam generator configuration allows the accommodation of the collimator stack 70′ on the inside of the generator chamber 51′, while enabling the collimator stack 70′ and the generator chamber 51′ to be independently supported by the external reference frame. Direct rigid mechanical coupling between the collimator stack 70′ and the generator chamber 51′ is thereby avoided.

The proposed mechanical decoupling between the collimator stack 70′ and the beam generator chamber 51′ may advantageously reduce the effects of pressure-induced deformations of the generator source chamber 51′ on the alignment of the collimator stack 70′, and/or reduce effects of thermally induced deformations of the electrode stack 70′ on the geometry of the generator chamber 51′.

Alternatively or in addition, the proposed mechanical decoupling may reduce or even eliminate the contribution of the generator chamber 51′ to the mechanical resonance (eigen-)frequencies of the collimator electrode stack 70′.

Alternatively or in addition, the proposed beam generator configuration allows the collimator stack 70′ to be operated under vacuum conditions created inside the generator chamber 51′, while position and alignment of the collimator stack 70′ can still be adjusted from outside the vacuum chamber 51′. This greatly facilitates alignment and performance testing of the collimator stack, and helps to improve beam accuracy.

The proposed support configuration with mechanical decoupling allows the construction of a generator chamber 51′ that has relatively thin walls and low mass. The described beam generator embodiment 50′ can therefore be conveniently formed as a module that is insertable into and removable from a carrier frame 42 provided inside a vacuum chamber 30 of a charged particle lithography system 10 (e.g. shown in FIG. 1 ).

As indicated herein above, either one of the proposed support configurations (i.e. for mechanically decoupling the beam generator chamber 51′ and the electrode collimator stack 70′ on the one hand, and for mechanically decoupling the source vacuum chamber 53′ and the electrode collimator stack 70′ on the other hand) may be implemented alone. The embodiment described with reference to FIGS. 9-10 nevertheless illustrates that these decoupling solutions may also be implemented together, by utilizing the same stack support structure and thereby keeping the required space and constructional complexity relatively low.

Both of the mechanical decoupling solutions may be considered distinct solutions, and neither of these solutions requires that the collimator stack supports 93′-96 b are connected to a middle region 75 a′ of the collimator stack 70′. The described mechanical decoupling between the beam generator chamber 51′ and the electrode collimator stack 70′ may generally be applied in any beam generator that comprises a vacuum chamber with an electrode stack on an inside, and stack supports that are attached to a lateral region of the collimator electrode stack.

The embodiment described with reference to FIGS. 9-10 nevertheless illustrates that these decoupling solutions may be implemented together with collimator stack supports 93′-96 b that engage in the middle region 75 a′ of the collimator stack 70′, to beneficially lower resonance sensitivity of the collimator electrode stack 70′ to all the three resonance frequency effects discussed herein above, while utilizing the same stack support structure and thereby keeping the required space and constructional complexity relatively low.

FIG. 12 schematically shows that, on a lower (i.e. downstream) side of this second embodiment of the beam generator 50′, the collimator electrode stack 70′ and the beam generator chamber 51′ are configured to remain mechanically separated. The beam generator chamber 51′ and the collimator electrode stack 70′ can thus remain separately supported by the external reference frame 42. FIG. 12 shows that the beam generator chamber 51′ comprises bottom plate 134, which forms part of the lower chamber portion 51 b shown in FIG. 10 . The bottom plate 134 comprises a radially inner chamber plate portion 134 a that is relatively thin and located radially proximate to the collimator electrode stack, and a radially outward chamber plate portion 134 b that is thicker than the radially inner chamber plate portion 134 a, and which is located radially closer to the outer chamber perimeter 130. The inner plate portion 134 a is located proximate to the last collimator electrode 80′. In particular, the inner plate portion 134 a is proximate to the radially inner electrode portion 80 a′ in the radial direction R′, and proximate to the radially outer electrode portion 80 b′ in the axial direction Z′. A narrow gap ΔZ is defined between the inner plate portion 134 a and the last collimator electrode 80′. This gap ΔZ preferably has a constant height along the radial direction R′. Preferably, the height of the gap ΔZ is approximately 0.5 millimeters or smaller.

Furthermore, the surfaces delineating this gap ΔZ preferably have smooth curvatures, in particular at a radially inward distal end of the inner plate portion 134 a, to avoid electric discharge between the last collimator electrode 80′ (which may be kept at an electric potential in the order of 1 kilovolt during operation) and the inner plate portion 134 a of the beam generator chamber 51′ (which is preferably kept at ground potential during operation).

The resulting support configuration allows the beam generator chamber 51′ and the collimator electrode stack 70′ to be independently supported by the external reference frame 42. For example the external reference frame 42 may support the beam generator chamber 51′ at its bottom plate 134, whereas laterally protruding stack support legs 93′ carry the collimator electrode stack 70′ and are in turn supported outside the beam generator chamber 51′ by the external reference frame 42.

FIG. 12 also illustrates that the stack support leg 93′ may be connected to a penultimate collimator electrode 79′, to increase stability. The stack support leg 93′ comprises a third leg joint 94 c for connecting the third leg member 93 c′ a body edge of the penultimate electrode 79′. The third leg joint 94 c may for example be fixed to the penultimate collimator electrode 79′ by means of a threaded connection, or other known methods. The third leg member 93 c may comprise a third deflection portion 96 c that permits the stack support leg 93 to accommodate differential thermal deformations between the middle collimator electrode 75′ supported by the first and second leg members 93 a′-93 b′ on the one hand (see FIG. 9 ), and the penultimate electrode 79′ supported by the third leg member 93 c on the other hand.

FIG. 12 furthermore illustrates that the inter-electrode heights Hd′ between the collimator electrodes 78′-80′ may be constant. In particular, the inter-electrode height Hd′ between the penultimate electrode 79′ and the radially inner electrode portion 80 a′ of the last electrode 80′ preferably equals the inter-electrode height Hd′ between the two-to-last electrode 78′ and the penultimate electrode 79′.

FIG. 13 illustrates a configuration of the support columns 90′ in the second collimator stack 70′ embodiment. The electrode support portions 86′ of adjacent collimator electrodes and interposed spacing structures 89′ are axially aligned to define the stack support columns 90′, which are oriented substantially parallel with the axial direction Z′. Three support columns 90′ are formed in this embodiment. Each of the electrode support portions 86′ and the spacing structures 89′ is provided with a through hole, which is extends substantially parallel with the axial direction Z′. The through holes in each support column 90′ are mutually aligned to form an integral column through hole. The aligned through holes of the support column 90′ accommodate a clamping member 91 a′-91 d′ for holding the support portions 86′ and intermediate spacing structures 89′ together. The clamping member comprises e.g. an axial pre-tensioned rod 91 b′ that pulls together the two distal ends 91 a′ of the pre-tensioned rod. The two distal rod ends 91 a′ are coupled to the first and last (i.e. outer) electrodes 71′, 80′ respectively. Each pre-tensioned rod 91 b′ is provided with two narrowings 91 c′, to accommodate differential thermal deformation between the collimator stack 70′ and the respective pre-tensioned rod 91 b′. In addition, a spring member 91 d may be provided on one or both distal rod ends 91 a′ of each pre-tensioned rod 91 b′, to provide an additional compensation mechanism for differential axial thermal deformation between the collimator stack 70′ and the respective pre-tensioned rod 91 b′. The clamping members 91 a′, 91 b′ are preferably made of a strong and non-magnetic material e.g. titanium. Sufficient radial interspacing is provided between an outer perimeter of each pre-tensioned rod 91 b′ and the inner perimeters of the through holes in the electrode support portions 86′ inside which the pre-tensioned rod 91 b′ is accommodated.

In the case of cylindrical through holes and rods, inner diameters Øsu of the through holes in the support portions 86 and inner diameters Øsp of the through holes in the spacing structures 89 are both substantially larger than an outer diameter Ør of the pre-tensioned rod 91 b′.

The radial interspacing serves to maintain electrical separation between the respective electrodes 71′-80′ on the one hand and each pre-tensioned rod 91 b′ on the other hand, even if the electrodes experience thermal radial deformations during operation of the collimator electrode stack 70′. Due to the required through holes inside the electrode support portions 86′ of this embodiment, a typical diameter of the electrode support portion 86′ will be larger than a diameter of an electrode support portion 86 in the collimator electrode embodiment shown in FIGS. 4-5 , for example about 1.5 times larger.

FIG. 14 schematically illustrates a portion of the cooling arrangement in the embodiment of the collimator electrode stack 70′ shown in FIGS. 9-11 . FIG. 14 shows the second, third, and fourth collimator electrodes 72′-74′, which are formed as collimator electrodes that are each provided with a cooling conduit 105′ on an inside of the electrode body. Interconnecting conduits (formed as intermediate tubular elements) 110′ are provided between first conduit openings 103′ of first electrodes (e.g. the fourth electrode 74′) and second conduit openings 104′ of second electrodes (e.g. the third electrode 73′). In this embodiment, each pair of interconnected electrodes are directly adjacent, and the resulting cascade of electrodes and interconnecting conduits forms a serial cooling arrangement. In this embodiment, each interconnecting conduit 110′ comprises a first straight conduit portion 111′, a curved conduit portion 113′, and a second straight conduit portion 112′. In this embodiment, the conduit portions 111′-113′ are made of a mechanically strong and non-magnetic material e.g. titanium. In contrast to the embodiment shown in FIG. 3 , there are no conduit bellows provided between the conduit portions 111′-113′. Instead, at least one of the straight conduit portions 111′-112′ of each interconnecting conduit 110′ is provided with an insulating tube connector 115. The corresponding conduit portion 111′-112′ is discontinued inside the insulating tube connector 115, and terminates at two distal conduit ends. These distal conduit ends are fixed to two opposite ends of the insulating tube connector 115 in a liquid tight manner, by means of insulating tube connectors 115 a-115 b. The insulating tube connectors 115 a-115 b may be formed by compression fittings with O-rings. The insulating tube connector 115 is made of an electrically insulating material (e.g. aluminum oxide), which provides electrical insulation between the interconnected conduit portions. The proposed conduit arrangement with insulating tube connector 115 ensures that electrical discharge between interconnected collimator electrodes is reduced.

Also in contrast to the embodiment shown in FIG. 3 , the supply tube 117′ and discharge tube 118′ in the second cooling arrangement are not provided with further conduit bellows. Instead, the supply tube 117′ and the discharge tube 118′ (shown in FIGS. 9-10 ) have considerable lengths and are provided with curved regions for damping mechanical resonances originating from outside the beam generator 50′.

FIG. 15 shows another embodiment of a collimator electrode stack 70″ comprising a stack support system 93″ for supporting the collimator electrode stack 70″ with respect to an external reference frame (42, not shown), and connected to a lateral region 97 of the collimator electrode stack 70″. The lateral region corresponds to the outward perimeter of the collimator stack 70″, which faces predominantly outward along the radial coordinate. In this embodiment, one leg member 93 a″ of the stack support leg 93″ engages with a third collimator electrode 73″. A further leg member 93 c′″ of the stack support leg 93″ engages with an eighth collimator electrode 78″. In this embodiment, the heights He of the collimator electrodes 71″-80″ are substantially equal. In addition, the inter-electrode distances Hd are substantially equal. The third collimator electrode 73″ and the eighth collimator electrode 78″ comprise electrode support portions 86″ with electrode support arms that have sufficient mechanical strength to jointly support the weights of the entire collimator electrode stack 70″ with respect to the stack support legs 93″. As a result, also the third collimator electrode 73″ and the eighth collimator electrode 78″ comprise thermal expansion spaces 88″ for accommodating differential thermal deformation between the electrode bodies 81″ and the support portions 86″, while keeping the support column 90″ in a fixed position.

The descriptions above are intended to be illustrative, not limiting. It will be apparent to the person skilled in the art that alternative and equivalent embodiments of the invention can be conceived and reduced to practice, without departing from the scope of the claims set out below.

For example, the above descriptions of collimator electrode stack embodiments and charged particle beam generator embodiments suggest the presence of exactly three electrode stack support columns and three electrode stack support legs. Although the number three is preferred for high stability and constructional simplicity, configurations with only two columns and/or legs or with more than three columns and/or legs or are also conceivable.

The support legs in a collimator stack may engage with the spacing structures in the support columns, as an alternative or in addition to engaging the middle collimator electrode, to establish a balanced suspension with respect to an external reference frame.

The stack support system may be shaped differently from the described triangular and tripod leg structures. The stack support systems described in the above embodiments extended from the electrode stack predominantly downwards to the external reference frame. In general, the external reference frame (e.g. carrier frame 42) may support the electrode stack in the middle region via support members that may be oriented in any of a downward axial direction Z (compression stresses exerted on support legs 93 in FIG. 4 ), an upward axial direction −Z (tensile stresses exerted on support members), a radial direction R (bending stresses on support members), balanced opposite angular directions Φ, or combinations thereof. Furthermore, the radial deflection portions may be formed differently, e.g. having a different shape, cross-sectional profile, or made from other resilient materials.

FIG. 16 schematically shows a charged particle beam generator of an exemplary embodiment. The beam generator comprises a charged particle source 1003 for generating a diverging charged particle beam, a collimator system for refracting the charged particle beam, and an aperture array 1006. The collimator system may comprise an Einzel lens comprising three lenses 1005 a, 1005 b, 1005 c and a further lens 1005 d. The aperture array 1006 is arranged for forming a plurality of charged particle beamlets from the beam generated by the source 1003. The beam generator may comprise one or more openings of a pumping system. The opening may be connected to a (vacuum) pump. The one or more openings may form an integrated part of the pumping system, or the one or more openings may be connectible to one or more pumps within the pumping system. The one or more openings may be part of one or more pumps 1220, the pumps 1220 being included by the beam generator. The pumps may be getter pumps or sublimation pumps, such as titanium sublimation pumps. Hereafter, exemplary embodiments will be discussed in which one or more pumps 1220 are included in the beam generator.

One or more lenses within the collimator system, typically lens 1005 b and 1005 d, operate at a high voltage, e.g. a voltage that is higher than 500 eV. Electrode 1005 b, i.e. the center electrode of the Einzel lens arrangement, may be used to refract the charged particle beam. A suitable voltage for this lens may be 15-25 kV, for example about 20 kV. Lenses 1005 a, 1005 e may be kept at 0V. Further lens 1005 d may be used to correct aberrations, as will be discussed later. Lens 5 d may operate at a much lower voltage, for example about 1 kV.

The presence of high voltages on non-designated components within the system is undesired, for example because such voltages create additional fields that would influence the charged particle beam in an undesirable, and often unpredictable way. Therefore, the lenses 1005 a-1005 d, and in this embodiment also the aperture array 1006 may be located within a high voltage shielding arrangement 1201 for shielding components outside the arrangement 1201 from high voltages that are present within the shielding arrangement 1201. Furthermore, the charged particle beam that is present during use may be shielded from fields originating from locations outside the high voltage shielding arrangement 1201, which may negatively influence the uniformity of the beam and/or may introduce additional aberrations. Preferably, the shielding arrangement 1201 comprises a wire mesh structure. The use of a wire mesh structure instead of a closed structure with some small openings therein is that the volume within the shielding arrangement 1201 can be more easily pumped down to obtain a suitable vacuum pressure.

The one or more pumps 1220 are placed outside the shielding arrangement 1201 to avoid that the one or more pumps would be charged. The charged particle beam generates heat, in particular as a result of charged particles back-scattering from the aperture plate 1006. As a result, the one or more pumps 1220 are heated as well, which could affect their efficiency. The operation of other components may also be negatively influenced by heating. Therefore, the beam generator may further comprise a cooling arrangement 1203 for removing heat, such as heat generated within the collimator system. The cooling arrangement 1203 may surround the high voltage shielding arrangement 1201 and the one or more pumps 1220. As a result, the one or more pumps 1220 may be located between the high voltage shielding arrangement 1201 and the cooling arrangement 1203. The cooling arrangement 1203 may comprise one or more cooling channels 1204 through which a cooling liquid, such as water, may flow. The use of active cooling by means of cooling channels with a cooling liquid flow therein enhances heat transfer as compared to a heat sink made of a heat conductive material.

Preferably, a magnetic shield arrangement 1205 surrounds the cooling arrangement 1203. The use of a magnetic shield arrangement 1205 blocks external magnetic fields which could influence the charged particle beam. Preferably, the magnetic shield arrangement 1205 comprises one or more walls comprising a magnetic shielding material with a magnetic permeability greater than about 20,000. Preferably, the magnetic shielding material has a magnetic permeability greater than about 300,000. Most preferably, the magnetic shielding material also has a low remanence. Examples of magnetic shielding materials, include, but are not limited to a type of mu-metal and Nanovate™-EM.

The magnetic shield arrangement 1205 does not block magnetic fields generated by wiring within the arrangement 1205 to interfere with the charged particle beam. Such wiring is for example present to charge the electrodes 1005 b, 1005 d. For this reason, the wires within the magnetic shield arrangement 1205 are preferably straight and oriented in a radial direction with respect to the center of the collimator system. Furthermore, the wiring may be in such a way that the magnetic fields of different wires cancel each other out as much as possible. Outside the magnetic shield arrangement 1205, the orientation of the wires is of less importance, because magnetic fields generated by the wires at these locations may be blocked by the arrangement 1205. Note that the magnetic shield arrangement 1205 does not necessarily need to be a closed structure. In particular at the bottom, the arrangement 1205 may be open, in FIG. 16 denoted by the dashed line.

All components including high voltage shield arrangement 1201, cooling arrangement 1203 and magnetic field shield arrangement 1205 may be placed within a vacuum chamber 1101. The use of a separate vacuum chamber for a portion of a lithography apparatus may be useful in a modular design. All components within the vacuum chamber may then for example be aligned with respect to each other and being tested prior to shipment towards a manufacturing environment.

FIG. 17 schematically shows an overview of an exemplary beam generator. In FIG. 17 , preferably the source 1003 is located in an area 1102 with a higher vacuum than the area 1103 in which the collimator resides. The collimator is schematically depicted as a block with reference number 1300. The collimator may be supported by a support structure 1230 with feet 1231. The support structures 1230 may take the form of so-called A-structures. The support structure 1230 may be connected to a frame 1240. To establish a vacuum, the beam generator may comprise one or more ports 1250, 1251 for initial pump-down. Reference number 1260 refers to a flange that may be arranged for coupling in cooling fluid and/or wiring.

FIG. 18 shows an elevated side view of a beam generator 1400 according to an exemplary embodiment of the invention. The beam generator comprises a housing, which in this embodiment comprises three parts 1401 a, 1401 b and 1401 c connected to each other by means of flanges 1402. Housing part 1401 a accommodates a source 1003, housing part 1401 b accommodates an Einzel lens having three electrodes 1005 a, 1005 b and 1005 c, and housing part 1401 c accommodates a further electrode 1005 d for aberration corrections.

At the outside of the housing connections are available for accommodating supply and removal of cooling fluid to be used by a cooling arrangement. A suitable cooling fluid is water. A supply unit, such as a supply tube, for supply of cooling fluid may be connected to an inlet 1405 a of a fluid supply conduit 1407 a. Similarly, a fluid removal unit, such as a tube, for removal of cooling fluid, may be connected to an outlet 1405 b of a fluid removal conduit 1407 b.

The housing further accommodates support of a high voltage supply unit 1408. The high voltage supply unit 1408 contains a wire 1409 via which a high voltage is applied to the middle electrode 1005 b of the Einzel lens. Additionally, a high voltage may be applied to the further electrode 1005 d. The wire is suitable insulated by means of a insulating structure 1410 to avoid discharges.

The beam generator 1400 is placed in a vacuum chamber. The pressure in the vacuum chamber may be reduced by means of pumps 1411 that are connected to the housing of the beam generator 1400.

Support structures 1230 and feet 1231 may be used to support the beam generator 1400.

FIG. 19 shows a first cross-sectional side view of the beam generator of FIG. 18 . The source 1003 is placed in a separate source chamber 1102. The pressure in the source chamber 1102 may be regulated by means of one or more pumps 1412. The beam generator comprises multiple pumps 1220 that are arranged in circumference of the cavity through which the beam passes during use behind a high voltage shielding arrangement 1201. The high voltage shielding arrangement 1201 in this embodiment comprises a wire mesh structure. The use of a wire mesh structure provides sufficient shielding from high voltages, while simultaneously allowing the pumps 1220 to have sufficient access to the space within the high voltage shielding arrangement 1201 to create a suitable vacuum pressure.

The pumps 1220 effectively regulate the pressure within a chamber formed within the housing parts 1401 b and 1401 c.

FIG. 20 shows a second cross-sectional side view of the beam generator of FIG. 18 . In this cross-sectional view, portions of a cooling arrangement of the beam generator are depicted. In particular, FIG. 20 shows inlet 1405 a and a portion of a fluid supply conduit 1407 a for accommodating a supply of cooling fluid, as well as outlet 1405 b and a portion of a fluid removal conduit 1407 b for removal of cooling fluid after it has absorbed heat in the beam generator.

FIG. 21 shows an elevated side view of the beam generator of FIG. 18 . In this view, tube splitters 1406 are shown, which divide the streams of cooling fluid to different portions of the cooling arrangement. In some embodiments, the cooling arrangement is divided in three segments. An upper segment of the cooling arrangement may then be arranged for cooling the upper electrode 1005 a of the Einzel lens. A middle segment of the cooling arrangement may then be arranged for cooling the lower electrode 1005 c of the Einzel lens. Finally, a lower segment of the cooling arrangement may be used for cooling the further electrode 1005 d. It will be understood that in embodiments where a further electrode 1005 d is absent, fewer segments may be used.

In the presently shown embodiment, the middle electrode 1005 b of the Einzel lens is not actively cooled by means of a cooling fluid.

FIG. 22 shows another elevated side view of the beam generator of FIG. 18 . In this view, a patch panel 1420 is shown for arranging a connection of wiring. Additionally, this view shows the presence of contra weights 1430. The contra weights 1430 may be used to adapt the center of mass of the beam generator so as to allow a stable structure with more predictable characteristics.

In some embodiments, such as the embodiment discussed with reference to FIGS. 18-22 , a cavity within the collimator lens may form a chamber with a mostly closed nature, i.e. the housing surrounding the collimator lens has limited openings. As a result, one or more pump outlets, in some embodiments part of pumps 1220, may create a relatively low vacuum pressure within the cavity, e.g. a pressure in the order of 10⁻⁶ bar, but lower pressures up to 10⁻¹⁰ bar are achievable. A low pressure within the collimator lens reduces ionization of residual molecules which could not only negatively affect the charged particle beam, but also may lead to actual impingement of ions onto the source 1003. Such impingement could seriously limit the lifetime of the source 1003, and is therefore undesirable.

The various embodiments have been discussed with reference to electron beam lithography processing. However, the principles discussed herein above may equally well be applied to generation of other charged particle beam types (e.g. beams of positive or negative ions), and to other types of charged particle beam processing methods (e.g. to electron beam based target inspection).

The embodiments have been discussed with reference to a collimator electrode stack that is adapted for collimating a beam of charged particles. Electrode stacks that are generally configured for manipulating the path, shape, and kinetic energy of one or more charged particle beams are understood to be also covered. 

The invention claimed is:
 1. An electron-optical module of an electron-optical apparatus, the electron-optical module comprising: a vacuum chamber; a high voltage shielding arrangement located within the vacuum chamber; and an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement, wherein the electron-optical module is configured to be removable from the electron-optical apparatus.
 2. The electron-optical module of claim 1, further comprising a magnetic shield arrangement, wherein the aperture array is within the magnetic shield arrangement.
 3. The electron-optical module of claim 2, further comprising a cooling arrangement configured to remove heat generated by the electron-optical module, the cooling arrangement being within the magnetic shielding arrangement.
 4. The electron-optical module of claim 1, further comprising a cooling arrangement configured to remove heat generated in the electron-optical module, the cooling arrangement being around the high voltage shielding arrangement.
 5. The electron-optical module of claim 4, wherein the cooling arrangement comprises one or more cooling channels configured for a flow of a cooling liquid.
 6. The electron-optical module of claim 1, further comprising a pump.
 7. The electron-optical module of claim 6, wherein the pump is outside the high voltage shielding arrangement.
 8. The electron-optical module of claim 2, further comprising a pump outside the high voltage shielding arrangement and within the magnetic shielding arrangement.
 9. The electron optical module of claim 4, further comprising a pump outside the high voltage shielding arrangement and within the cooling arrangement.
 10. An electron-optical apparatus comprising the electron-optical module of claim 1, wherein the electron-optical apparatus and the electron-optical module are configured for the electron-optical module to be removable from the electron optical apparatus.
 11. The electron-optical apparatus of claim 10, further comprising a carrier frame configured to enable removal and insertion of the electron-optical module.
 12. The electron-optical module of claim 11, further comprising another vacuum chamber, wherein the carrier frame is located within the another vacuum chamber.
 13. The electron-optical apparatus of claim 10, wherein the electron-optical apparatus is an inspection apparatus.
 14. An electron-optical apparatus comprising an electron-optical module, wherein the electron-optical apparatus and the electron-optical module are configured for the electron-optical module to be removable from the electron-optical apparatus, the electron-optical module comprising: a vacuum chamber; a high voltage shielding arrangement located within the vacuum chamber; an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement; and a cooling arrangement configured to remove heat from the electron-optical module and being around the high voltage shielding arrangement.
 15. The electron-optical apparatus of claim 14, wherein the electron-optical module further comprises a magnetic shield arrangement comprising one or more walls, wherein the aperture array is within the magnetic shield arrangement.
 16. The electron-optical apparatus of claim 14, wherein the electron-optical module further comprises a pump outside the high voltage shielding arrangement.
 17. The electron-optical apparatus of claim 16, wherein the cooling arrangement is configured to surround the pump and/or the high voltage shielding arrangement.
 18. The electron-optical apparatus of claim 16, wherein the pump is configured to regulate a pressure of a space within the high voltage shielding arrangement, wherein the pump is outside the high voltage shielding arrangement.
 19. The electron-optical apparatus of claim 14, wherein the electron-optical apparatus is configured for inspecting a substrate and the electron-optical module further comprises: an electron source configured to generate the electron beam to be projected onto the substate; and another vacuum chamber for accommodating components of the electron-optical module, wherein the high voltage shielding arrangement is configured to shield components outside the high voltage shielding arrangement from high voltages that are present within the high shielding arrangement and the aperture array is configured to form the plurality of beamlets from the electron beam.
 20. The electron-optical apparatus of claim 14, wherein the electron-optical module and the electron optical apparatus are configured so that the electron-optical module is removable from the electron-optical apparatus. 